晶圆研磨GNX200BP晶圆背抛

  • 发布时间:2019-11-07 09:24:30,加入时间:2012年07月18日(距今4672天)
  • 地址:中国»广东»深圳:南山区南头街道艺园路133号田厦IC产业园3018
  • 公司:深圳市衡鹏瑞和科技有限公司, 用户等级:普通会员 已认证
  • 联系:刘庆,手机:13923818033 电话:0755-22232285

——又称晶圆减薄/晶圆抛光(Wafer Grinding)

GNX200BP晶圆研磨/晶圆背抛概要

GNX200BP Wafer Grinding is a fully automatic continuous downfeed grinding machine. Wafers are handled through the machine by a robot, and load/unload arms. Two different stations are used for wafer cleaning after the final grind station. Chuck speed, grinding wheel, and grind spindle downfeed rate speeds can be used to manipulate grinder throughput, surface finish, and wheel life. A two-point in-process gauge measuring system controls wafer thickness under grind spindles 1 and 2. A three-point grind spindle angle adjustment mechanism is utilized for easily maintaining wafer profile (ttv); with the option a motorized adjustment. After completion at the grind station, the wafer transfers to Polish unit automatically. The local polishing unit removes subsurface damage for increased wafer die strength, and the ability to handle final thickness of 50 microns.

GNX200BP晶圆研磨/晶圆背抛规格

Maximum wafer-machining diameter of wafer 64” or 8”

Grinding Spindle:  Bearing type                 Air bearing, maximum 3600rpm

                 Motor                        2.2kw,4P,high frequency motor 

                 Rapid feed speed             200mm/min

                 Grind feed speed         1 to 999 μm/min 

Grinding wheel size                         ­250 mm

Index Table: Number of work spindles            3 

           Work spindle Bearing type          Mechanical Bearing, or Air Bearing (optional) 

           Speed of Work Spindles         1 to 600 rpm

Automatic Sizing Device:

      Wafer thickness measuring system        2 point contact in-process gauge 

      Wafer minimum setting size              1 μm 

      Wafer size display range         0to 1.2 mm; extended range software available

Table Cleaning Device (Grinder side) Water + Ceramic block

Wafer Cleaning Unit (Grinder side)         Water + brush, and spin/rinse dry station

Number of Cassettes                         2 stations for each unit (Grinder & Polish unit)

Polish head                                     3 Kw AC servo motor for 10 – 460 rpm 

Oscillation speed                               100–8,000 mm/min.

Head Load                                       50 –999 g//cm2 

Pad size                                 200mm O.D.

Polish table speed                              3 Kw AC servo motor for 50 – 200rpm 

Vacuum Chuck material                           Alumina ceramics (dedicate size of wafer)

Chuck cleaning                                 Brush + Water

Wafer cleaning                                 N.C.W + DI water for Polish surface & Air blow spin dry

GNX200BP晶圆研磨/晶圆背抛相关产品:

衡鹏供应

GDM300晶圆研磨/晶圆减薄/晶圆抛光/晶圆背抛/Wafer Grinding

联系我时请说明来自志趣网,谢谢!

免责申明:志趣网所展示的信息由用户自行提供,其真实性、合法性、准确性由信息发布人负责。使用本网站的所有用户须接受并遵守法律法规。志趣网不提供任何保证,并不承担任何法律责任。 志趣网建议您交易小心谨慎。